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PEMS: Plasma Enhanced Magnetron Sputtering
The HEF patented PEMS is magnetron sputtering enhanced by an auxiliary plasma source. Also called ("booster").
This triode system allows to monitor separately the material flux and the ionic assistance, the third independent electrode being the bias on the substrate.
This proprietary technology can provide a multitude of high-quality coatings for extreme wear and friction environments. Also, hardness, density, and toughness can be modified to suit the application.
CAM: Coating Assisted by Microwaves
At the forefront of vacuum technology, CAM is a genuine breakthrough, permitting the deposition of hard and ultra-low friction coatings at a very low temperature. Another major advantage is the ability to coat at low pressure also, allowing more efficient filling of the chamber, and improved productivity. For CVD deposition, the plasma is generated by auxiliary sources, independent from the part to be coated.
M-ARC: Modified ARC
This high-throughput plasma-arc method was developed by HEF partner, Northeast Coating Technologies (NCT), and dramatically reduces droplets normally associated with arc-deposited coatings. It is a cost-effective solution for a wide range of applications such as forming and cutting tools.
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